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  1. 1
    Photomask and next-generation lithography mask technology XI 14-16 April, 2004, Yokohama, Japan /
    Publicat 2004

    Actes de congresos Llibre
  2. 2
    Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA /
    Publicat 2004

    Llibre
  3. 3
    The physics of submicron lithography /
    per Valiev, Kamil� Akhmetovich
    Publicat 1992

    Llibre
  4. 4
    Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /
    Publicat 1987

    Llibre
  5. 5
    Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan /
    Publicat 1965

    Actes de congresos Llibre
  6. 6
    Resists in microlithography and printing /
    per Bedn�a�r, B
    Publicat 1993

    Llibre
  7. 7
    Optical microlithography XII : 17-19 March, 1999, Santa Clara, California /
    Publicat 1999

    Llibre
  8. 8
    Optical microlithography XVII : 24-27 February, 2004, Santa Clara, California, USA /
    Publicat 2004

    Llibre
  9. 9
    Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA /
    Publicat 2004

    Llibre
  10. 10
    Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan /
    Publicat 2004

    Actes de congresos Llibre
  11. 11
    Advanced microlithography technologies 8-10 November 2004, Beijing, China /
    Publicat 2005

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  12. 12
    Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA /
    Publicat 2005

    Llibre
  13. 13
    Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan /
    Publicat 2001

    Actes de congresos Llibre
  14. 14
    Emerging lithographic technologies XI 27 February-1 March 2007, San Jose, California, USA /
    Publicat 2007

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  15. 15
    Photomask and next-generation lithography mask technology XIV 17-19 April 2007, Yokohama, Japan /
    Publicat 2007

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  16. 16
    Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA /
    Publicat 2007

    Llibre
  17. 17
    Photomask and next-generation lithography mask technology XVI 8-10 April 2009, Yokohama, Japan /
    Publicat 2009

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  18. 18
    Photomask and next-generation lithography mask technology XIII 18-20 April, 2006, Yokohama, Japan /
    Publicat 2006

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  19. 19
    Emerging lithographic technologies X San Jose, CA, USA, 21 February, 2006 /
    Publicat 2006

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
  20. 20
    Photomask and next-generation lithography mask technology XII 13-15 April 2005, Yokohama, Japan /
    Publicat 2005

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Electrònic Llibre
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