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  1. 1
    Photomask and next-generation lithography mask technology XI 14-16 April, 2004, Yokohama, Japan /
    Publicado em 2004

    Conference Proceeding Livro
  2. 2
    Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA /
    Publicado em 2004

    Livro
  3. 3
    The physics of submicron lithography /
    Por Valiev, Kamil� Akhmetovich
    Publicado em 1992

    Livro
  4. 4
    Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /
    Publicado em 1987

    Livro
  5. 5
    Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan /
    Publicado em 1965

    Conference Proceeding Livro
  6. 6
    Resists in microlithography and printing /
    Por Bedn�a�r, B
    Publicado em 1993

    Livro
  7. 7
    Optical microlithography XII : 17-19 March, 1999, Santa Clara, California /
    Publicado em 1999

    Livro
  8. 8
    Optical microlithography XVII : 24-27 February, 2004, Santa Clara, California, USA /
    Publicado em 2004

    Livro
  9. 9
    Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA /
    Publicado em 2004

    Livro
  10. 10
    Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan /
    Publicado em 2004

    Conference Proceeding Livro
  11. 11
    Advanced microlithography technologies 8-10 November 2004, Beijing, China /
    Publicado em 2005

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  12. 12
    Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA /
    Publicado em 2005

    Livro
  13. 13
    Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan /
    Publicado em 2001

    Conference Proceeding Livro
  14. 14
    Emerging lithographic technologies XI 27 February-1 March 2007, San Jose, California, USA /
    Publicado em 2007

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  15. 15
    Photomask and next-generation lithography mask technology XIV 17-19 April 2007, Yokohama, Japan /
    Publicado em 2007

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  16. 16
    Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA /
    Publicado em 2007

    Livro
  17. 17
    Photomask and next-generation lithography mask technology XVI 8-10 April 2009, Yokohama, Japan /
    Publicado em 2009

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  18. 18
    Photomask and next-generation lithography mask technology XIII 18-20 April, 2006, Yokohama, Japan /
    Publicado em 2006

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  19. 19
    Emerging lithographic technologies X San Jose, CA, USA, 21 February, 2006 /
    Publicado em 2006

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
  20. 20
    Photomask and next-generation lithography mask technology XII 13-15 April 2005, Yokohama, Japan /
    Publicado em 2005

    This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.
    Recurso Electrónico Livro
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