High density plasma sources : design, physics, and performance /
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
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| Format: | Book |
| Language: | English |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
c1995
Park Ridge, N.J. : ©1995 |
| Series: | Materials science and process technology series Electronic materials and process technology.
Materials science and process technology series |
| Subjects: |
Internet
This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.Stanford University
| Call Number: |
ISIL:US-CST QC718.5 .D4 H54 1995 |
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Columbia University
| Call Number: |
EBOOKS |
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